Deposition of New Binary Oxide Thin Films by the Pyrolytic Decomposition of Trimethylsiloxy-Aluminum-lsopropoxide (Me[sub 3]SiO)[sub n]Al(O[sup i]Pr)[sub 3−n]
- 1 January 1968
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 115 (10) , 1094
- https://doi.org/10.1149/1.2410898
Abstract
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