Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (II) –Relation between Resist Space Resolution and Space Distribution of Ionic Species–
- 30 June 2002
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 41 (Part 1, No) , 4213-4216
- https://doi.org/10.1143/jjap.41.4213
Abstract
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