Attenuation length and escape depth of excited electrons in solids
- 2 July 1978
- journal article
- Published by Elsevier in Surface Science
- Vol. 75 (2) , 267-278
- https://doi.org/10.1016/0039-6028(78)90251-0
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Electron attenuation lengths for free‐electron‐like metalsJournal of Vacuum Science and Technology, 1976
- Hot-electron attenuation measurements: comments relating to recent criticismsThin Solid Films, 1975
- Criticism of some hot-electron attenuation length measurementsThin Solid Films, 1975
- Auger and secondary electrons excited by backscattered electrons; An approach to quantitative analysisSurface Science, 1975
- Détermination de la profondeur d'origine d'électrons secondaires vrais dans l'or et l'aluminiumThin Solid Films, 1974
- Inelastic mean free paths for electrons in bulk jelliumSurface Science, 1974
- Attenuation lengths of low-energy electrons in solidsSurface Science, 1974
- The application of electron spectroscopy to surface studiesJournal of Vacuum Science and Technology, 1974
- Electron escape depth in siliconJournal of Electron Spectroscopy and Related Phenomena, 1974
- Secondary electron emission from thin filmsThin Solid Films, 1972