THE EVALUATION OF β-Si3N4 MICROSTRUCTURES USING PLASMA-ETCHING AS A PREPARATIVE TECHNIQUE
- 1 February 1986
- journal article
- Published by EDP Sciences in Le Journal de Physique Colloques
- Vol. 47 (C1) , C1-297
- https://doi.org/10.1051/jphyscol:1986143
Abstract
Plasma-etching has been used successfully to delineate the microstructures of two β-Si3N4 materials in order to facilitate their evaluation by electron microscopy. The use of this technique results in a more representative evaluation of the microstructuresKeywords
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