Noise in solid-state microstructures: A new perspective on individual defects, interface states and low-frequency (1/ƒ) noise
- 1 January 1989
- journal article
- research article
- Published by Taylor & Francis in Advances in Physics
- Vol. 38 (4) , 367-468
- https://doi.org/10.1080/00018738900101122
Abstract
In very small electronic devices the alternate capture and emission of carriers at an individual defect site generates discrete switching in the device resistance—referred to as a random telegraph signal (RTS). The study of RTSs has provided a powerful means of investigating the capture and emission kinetics of single defects, has demonstrated the defect origins of low-frequency (1/ƒ) noise in these devices, and has provided new insight into the nature of defects at the Si/SiO2 interface.Keywords
This publication has 77 references indexed in Scilit:
- Defect Interactions and Noise in Metallic NanoconstrictionsPhysical Review Letters, 1988
- Characteristic electronic defects at the Si-SiO2 interfaceApplied Physics Letters, 1983
- Deviation of 1/f voltage fluctuations from scale-similar Gaussian behaviorJournal of Statistical Physics, 1981
- Low frequency noise in junction field effect transistorsSolid-State Electronics, 1978
- Characteristics of burst noise intermittencySolid-State Electronics, 1978
- Nonradiative capture and recombination by multiphonon emission in GaAs and GaPPhysical Review B, 1977
- Minority carrier MIS tunnel diodes and their application to electron- and photo-voltaic energy conversion—II. ExperimentSolid-State Electronics, 1974
- Minority carrier MIS tunnel diodes and their application to electron- and photo-voltaic energy conversion—I. TheorySolid-State Electronics, 1974
- Frequency response of Si–SiO2 interface states on thin oxide MOS capacitorsPhysica Status Solidi (a), 1972
- CONTRIBUTIONS OF SURFACE STATES TO MOS IMPEDANCEApplied Physics Letters, 1967