Process monitoring during metalorganic chemical vapor deposition using FTIR spectroscopy

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Abstract
The ability of Fourier transform infrared spectroscopy to perform in-situ measurements of ferroelectric thin film properties during metalorganic chemical vapor deposition is demonstrated. Infrared measurements of film reflectance and radiance allowed determination of film composition, thickness and temperature in real-time. These spectra could also be used to follow process changes, determine deposition rate, and extract the wavelength dependent dielectric function. These data, along with computer software and optical hardware developments, are presented.

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