Paramagnetic nitrogen in chemical vapor deposition diamond thin films
- 7 October 1991
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (15) , 1870-1871
- https://doi.org/10.1063/1.106172
Abstract
Electron‐paramagnetic‐resonance (EPR) studies demonstrate the presence of nitrogen point defects in microwave‐assisted chemical vapor deposition (CVD) diamond thin films. Polycrystalline powder pattern EPR spectra are interpreted with g=2.0023, A∥=114.0 MHz, and A⊥=81.3 MHz. These spin parameters are identical to those of nitrogen in single crystal natural diamonds. Quantitative EPR and secondary ion‐mass spectrometry (SIMS) results of CVD diamond thin films suggest that nitrogen point defect formation is favored over aggregate nitrogen formation.Keywords
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