Characterization of Micromachined Coplanar Waveguides on Silicon up to 300 GHz

Abstract
We report the design, fabrication and characterization of a novel micromachined coplanar waveguide on high-resistivity silicon for millimeter-wave applications up to 300 GHz. Its high frequency characteristics are achieved using 10-μm deep V-grooves and thick and abrupt sidewalls metallization of up to 10 μm. We present the loss and dispersion results up to 300 GHz measured using a time domain technique and compare them to those of coplanar waveguides on other important millimeter wave substrates.

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