Using soft lithography to fabricate GaAs/AlGaAs heterostructure field effect transistors
- 6 October 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (14) , 2020-2022
- https://doi.org/10.1063/1.119774
Abstract
This letter describes the fabrication of functional GaAs/AlGaAs field effect transistors using micromolding in capillaries—a representative soft lithographic technique. The fabrication process involved three soft lithographic steps and two registration steps. Room temperature characteristics of these transistors resemble those of field effect transistors fabricated by photolithography. The fabrication of functional microelectronic devices using multilayer soft lithography establishes the compatibility of these techniques with the processing methods used in device fabrication, and opens the door for their development as a technique in this area.Keywords
This publication has 11 references indexed in Scilit:
- Elastomeric light valvesAdvanced Materials, 1997
- Replica molding using polymeric materials: A practical step toward nanomanufacturingAdvanced Materials, 1997
- Soft lithographic methods for nano-fabricationJournal of Materials Chemistry, 1997
- Elastomeric diffraction gratings as photothermal detectorsApplied Optics, 1996
- Rapid prototyping of complex structures with feature sizes larger than 20 μmAdvanced Materials, 1996
- Fabrication of three‐dimensional micro‐structures: Microtransfer moldingAdvanced Materials, 1996
- Complex Optical Surfaces Formed by Replica Molding Against Elastomeric MastersScience, 1996
- Fabrication of single‐mode polymeric waveguides using micromolding in capillariesAdvanced Materials, 1996
- Polymer microstructures formed by moulding in capillariesNature, 1995
- Microfabrication by microcontact printing of self‐assembled monolayersAdvanced Materials, 1994