Mass Spectrometric Transient Study of DC Plasma Etching of Si in NF 3 and NF 3 / O 2 Mixtures
- 1 November 1984
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 131 (11) , 2667-2670
- https://doi.org/10.1149/1.2115379
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: