Magnetic studies in multilayer Ni-C films
- 15 April 1987
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 61 (8) , 4073-4075
- https://doi.org/10.1063/1.338531
Abstract
Multilayer Ni-C films have been prepared using dc triode sputtering with a fixed C layer of 2 nm thick and with a Ni layer varying from 3 to 10 nm thick. The C layer is amorphous and the structure of the Ni layer is hexagonal for 3 nm thick but becomes fcc when the thickness is above 6 nm. The magnetization is strongly reduced which is attributed to the presence of nonmagnetic layers at each interface. These layers could be Ni3C. FMR indicates an easy perpendicular axis for t(Ni)>20 nm, but for t(Ni)<7 nm, the films develop an easy plane anisotropy. The Hc and the linewidth increases for t(Ni)<7 nm. Annealing at 473 K in vacuum leads to an increase in 4πM, indicating that C atoms are segregating out of the Ni layer and that the Ni film crystallizes better. The perpendicular anisotropy also develops strongly after annealing. The results are discussed.This publication has 4 references indexed in Scilit:
- Magnetization and FMR studies in multilayer Ni-Ag filmsSolid State Communications, 1986
- FMR studies in compositionally modulated Co-Nb and Co filmsJournal of Magnetism and Magnetic Materials, 1985
- Magnetic properties of Mo/Ni superlattices (invited)Journal of Applied Physics, 1984
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