Time-dependent simulation modelling of reactivesputtering
- 31 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 84-91
- https://doi.org/10.1016/s0040-6090(05)80015-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Process modeling of reactive sputteringJournal of Vacuum Science & Technology A, 1989
- Modeling of reactive sputtering of compound materialsJournal of Vacuum Science & Technology A, 1987
- Reactive sputter deposition: A quantitative analysisThin Solid Films, 1984
- The deposition rate of metallic thin films in the reactive sputtering processThin Solid Films, 1975
- Mechanism of rf reactive sputteringJournal of Applied Physics, 1975