Contamination of Silicon Surfaces Exposed to CHF 3 Plasmas: An XPS Study of the Film and the Film‐Surface Interface
- 1 June 1988
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 135 (6) , 1472-1477
- https://doi.org/10.1149/1.2096034
Abstract
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