Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

• 1 January 1996
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 9  (3) , 475-488
• https://doi.org/10.2494/photopolymer.9.475

Abstract

Keywords

• NM SINGLE
• ADAMANTYL GROUP
• LAYER RESIST
• IMPACT
• GROUP USED
• SINGLE LAYER
• METHYL