Polarization-independent strong Bragg gratings in Planar Lightwave Circuits from ArF laser irradiation through a phase mask.
- 1 January 1997
- proceedings article
- Published by Optica Publishing Group
Abstract
Highly functional Planar Lightwave Circuits (PLC) can be designed using silica-on-silicon waveguide technology,1 and the possibility of writing Bragg gratings in such waveguides further enhances their potential uses.2 Strong Bragg gratings photoinduced in planar silica-on-silicon waveguides with a germanium-doped core are usually obtained by high pressure hydrogen loading of the glass prior to exposure.2,3 In the work presented here we demonstrate that hydrogen loading is not necessary when high intensity light at 193 nm from an ArF laser is used to produce the index change, an effect originally observed in germanium-doped optical fibers.4,5 The waveguides used are standard PLCs with a core index difference (Δ) of 0.75% (commercially available) and 1%.1 One drawback of silica-on-silicon waveguides is their small strain birefringence.6,7 We show here that there is a sizeable birefringence in the ArF laser-induced average index change that is large enough and of the proper sign to compensate for the initial waveguide birefringence. For demonstration, 4 mm-long Bragg grating filters with more than 30 dB of transmission loss at the Bragg wavelength are presented.Keywords
This publication has 7 references indexed in Scilit:
- Recent progress in silica-based planar lightwave circuits on siliconIEE Proceedings - Optoelectronics, 1996
- Ultrastrong UV written gratings in PECVD grown germanosilicaterib waveguidesElectronics Letters, 1996
- Wavelength division multiplexer with photoinduced Bragg gratings fabricated in a planar-lightwave-circuit-type asymmetric Mach-Zehnder interferometer on SiIEEE Photonics Technology Letters, 1996
- Enhanced photosensitivity in lightly doped standardtelecommunication fibreexposed to high fluence ArF excimer laser lightElectronics Letters, 1995
- Photosensitivity in Ge-doped silica optical waveguides and fibers with 193-nm light from an ArF excimer laserOptics Letters, 1994
- High pressure H 2 loading as a technique for achieving ultrahigh UV photosensitivity and thermal sensitivity in GeO 2 doped optical fibresElectronics Letters, 1993
- Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase maskApplied Physics Letters, 1993