Electron Beam Exposure of Polymeric Resists
- 1 January 1972
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 9 (1) , 358-360
- https://doi.org/10.1116/1.1316612
Abstract
Two types of polymeric resists were exposed to pulsed electron beams under the following conditions: accelerating voltage 26–34 kV, beam current 10−4A, pulse length 4 μsec-16 msec. The exposure latitudes of thin layers of polystyrene and poly(methyl methacrylate) were studied. These polymers are well qualified as, respectively, negative and positive acting resists. However, poly(methyl methacrylate) with an average molecular weight below 20 000 is not resistant to etchants because of the pin-hole formation during developing.Keywords
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