Positive and negative photoresist applications of thin films surface‐photopolymerized from hexachlorobutadiene
- 1 May 1972
- journal article
- Published by Wiley in Polymer Engineering & Science
- Vol. 12 (3) , 209-212
- https://doi.org/10.1002/pen.760120309
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ultraviolet depolymerization of photoresist polymersPolymer Engineering & Science, 1972
- Surface-photopolymerization from hexachlorobutadieneJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1972
- Ultraviolet sources for photochemical applicationPolymer Engineering & Science, 1971
- Surface Photopolymerization of Vinyl and Diene MonomersNature, 1967