Removal of superfluid helium films from surfaces below 0.1 K
- 1 January 1992
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 63 (1) , 230-234
- https://doi.org/10.1063/1.1142964
Abstract
We have constructed an apparatus that is able to maintain a helium‐free surface at low temperature (T≤0.1 K) in a cell containing superfluid helium. We discuss the considerations involved in the design of this device, and describe tests that we have made to confirm that a film‐free surface has been produced.Keywords
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