Depth profiling of surface oxidized TiAlN film by synchrotron radiation excited X-ray photoelectron spectroscopy
- 1 April 1997
- journal article
- Published by Elsevier in Surface Science
- Vol. 377-379, 197-200
- https://doi.org/10.1016/s0039-6028(96)01350-7
Abstract
No abstract availableKeywords
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