Annealing studies of the microcrystalline silicon system
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 981-984
- https://doi.org/10.1016/0022-3093(93)91162-v
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Deposition of phosphorus doped microcrystalline silicon below 70 °C at 70 MHzJournal of Non-Crystalline Solids, 1991
- Experimental determination of the nanocrystalline volume fraction in silicon thin films from Raman spectroscopyApplied Physics Letters, 1988
- Critical volume fraction of crystallinity for conductivity percolation in phosphorus-doped Si:F:H alloysApplied Physics Letters, 1982
- Critical Density in Percolation ProcessesThe Journal of Chemical Physics, 1970