Silicon nitride ridge-type optical waveguides fabricated on oxidized silicon by laser direct writing
- 20 September 1992
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 31 (27) , 5830-5832
- https://doi.org/10.1364/ao.31.005830
Abstract
We fabricate ridge-type optical waveguides by laser direct writing. Lines of Si3N4, typically 10 μm wide and 0.6 μm high, are drawn on Si substrates covered with a 0.5-μm-thick SiO2 buffer layer. An Ar+ laser is used to heat the substrate locally and to induce a thermal reaction for SiH4 and NH3. The writing speed is up to 1.8 mm/min. The transmission loss for the TE0 is 0.6 dB/cm.Keywords
This publication has 3 references indexed in Scilit:
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- Laser fabricated GaAs waveguiding structuresApplied Physics Letters, 1989
- Single-step fabrication of ridge-type glass optical waveguides by laser chemical vapor depositionApplied Optics, 1989