Study of the H2 remote plasma cleaning of InP substrate for epitaxial growth

• 1 March 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 14  (2) , 691-697
• https://doi.org/10.1116/1.589158

Abstract

Keywords

• EPITAXIAL GROWTH