A Reshaping Technology With Joule Heat For Three Dimensional Silicon Structures
- 25 August 2005
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 1, 174-177
- https://doi.org/10.1109/sensor.1995.717127
Abstract
This paper presents a new basic reshaping technology which is efficient to realize real three dimensional silicon microstructures. In this process, the elastically deformed polysilicon structure is annealed by Joule heating generated by the current passing through the structure. Plastic deformation occurs resulting in permanent three-dimensional shapes. The application of this basic process to different polysilicon structures is successfully performed. Some quantitative characteristics of the annealing effects are also investigated by means of structure deformation measurements.This publication has 2 references indexed in Scilit:
- Photoresist-Assisted Release of Movable MicrostructuresJapanese Journal of Applied Physics, 1993
- Controlled stepwise motion in polysilicon microstructuresJournal of Microelectromechanical Systems, 1993