Ionic Reactions in Gaseous Monosilane
- 15 March 1966
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 44 (6) , 2257-2261
- https://doi.org/10.1063/1.1727031
Abstract
The ions SiH3+, Si2H+, Si2H2+, Si2H3+, Si2H4+, and Si2H5+ appear as products in ionized SiH4. All are formed from the attack of SiH2+ ions on SiH4 molecules. The specific reaction rates for the formation of these ions are, in units of cubic centimeters per moleule·second×1010, respectively, 1.7, 0.13, 0.67, 0.39, 1.1, and 0.068.Keywords
This publication has 22 references indexed in Scilit:
- An Electron Impact Study of Ionization and Dissociation of TrimethylsilanesJournal of the American Chemical Society, 1965
- ION–MOLECULE REACTIONS STUDIED BY TIME-OF-FLIGHT MASS SPECTROMETRYCanadian Journal of Chemistry, 1964
- The Determination of Silicon-Carbon and Silicon-Hydrogen Bond Dissociation Energies by Electron ImpactJournal of the American Chemical Society, 1962
- Radiation Induced Reaction of Silicon HydrideBulletin of the Chemical Society of Japan, 1962
- Reactions of Gaseous Ions. VIII. Multiple Order Ion-Molecule Reactions and the Ultra-High Pressure Mass Spectrum of EthyleneJournal of the American Chemical Society, 1961
- The Role of Ions in the Radiation Induced Exchange of Hydrogen and Deuterium1Journal of the American Chemical Society, 1958
- A Mass Spectrometric Study of Flash Photochemical Reactions. IJournal of the American Chemical Society, 1957
- High Energy Electron Irradiation of Methane. Remarks on the Reaction MechanismJournal of the American Chemical Society, 1957
- The Mobilities of Molecular and Atomic Rare Gas Ions in the Parent Gases: Helium, Neon, and ArgonPhysical Review B, 1950