Characterization of a reactive broad beam radio-frequency ion source

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Abstract
To overcome the problems of reactive gases on the lifetime of dc‐ion sources for etching and deposition applications a capacitively coupled radio frequency (rf)‐ion source has been developed. Details on the source characteristics will be given. The excitation of the ion‐source plasma is achieved by an electrical rf field at 27.12 MHz. Different rf–electrode configurations are used. The plasma density is enhanced by a multipolar magnetic field. The ion beam is extracted by a multiaperture three‐grid optics to obtain higher ion currents at low‐ion energies. At a rf‐power of 500 W for oxygen the 2‐in. beam diameter leads to an ion current of 40 mA which is equivalent to 2 mA/cm2. Data on the beam divergence and the ion energy of the beam have been taken. A divergence of 2.3° could be measured. Different reactive and nonreactive gases were tested and the source operates without lifetime problems.

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