XPS analysis of adsorption of oxygen molecules on the surface of Ti and TiNx films in vacuum
- 1 April 1992
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 58 (3) , 169-176
- https://doi.org/10.1016/0368-2048(92)80016-2
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- High Temperature microhardness of hard coatings produced by physical and chemical vapor depositionThin Solid Films, 1987
- Characteristics of titanium arc evaporation processesThin Solid Films, 1987
- Adhesion and structure of TiN arc coatingsThin Solid Films, 1987
- Fast deposition of metallurgical coatings and production of surface alloys using a pulsed high current vacuum arcThin Solid Films, 1986
- Thermal Stability of Hafnium and Titanium Nitride Diffusion Barriers in Multilayer Contacts to SiliconJournal of the Electrochemical Society, 1983
- Applications of TiN thin films in silicon device technologyThin Solid Films, 1982