The Effect of Uniaxial Stress on Ge p-n Junctions with Various Doping Densities
- 1 August 1963
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 2 (8) , 463-466
- https://doi.org/10.1143/jjap.2.463
Abstract
When p-n junctions with various doping densities are subjected to uniaxial stress perpendicular to the (111) junction plane, an extreme increase in the excess current with stress is found, in contrast with a small increase in the Esaki current. This change in the excess current of Esaki diodes is mainly ascribed to properties of heavily doped p-n junctions regardless of the existence of the Esaki characteristics. The experiments indicate that the stress sensitivity of p-n junctions becomes larger as the doping density becomes larger.Keywords
This publication has 4 references indexed in Scilit:
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- Experimental Tunnel-Diode Electromechanical Transducer Elements and Their Use in Tunnel-Diode MicrophonesThe Journal of the Acoustical Society of America, 1962
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- Pressure Dependence of the Current-Voltage Characteristics of Esaki DiodesPhysical Review Letters, 1960