Analogue delay-locked loop for spatial-phase locking

17 July 1997

journal article
Published by Institution of Engineering and Technology (IET) in Electronics Letters

Vol. 33 (15) , 1269-1270
https://doi.org/10.1049/el:19970858

Abstract

An analogue delay-locked loop has been developed for spatial-phase locking in a scanning electron-beam lithography system. The loop improves pattern-placement precision to 3σ ≃ 12 nm, by referencing all writing to a 400 nm-period grating. Results compare well with a numerical simulation.

Keywords

SCANNING ELECTRON-BEAM LITHOGRAPHY SYSTEM
PATTERN-PLACEMENT PRECISION
SPATIAL-PHASE LOCKING
ANALOGUE DELAY-LOCKED LOOP

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