Normal-incidence x-ray mirror for 7 nm
- 15 August 1991
- journal article
- Published by Optica Publishing Group in Optics Letters
- Vol. 16 (16) , 1283-1285
- https://doi.org/10.1364/ol.16.001283
Abstract
Multilayer (ML) structures composed of alternating, ultrathin layers of Ru and B4C have been grown by dc magnetron sputtering. The ML microstructure has been characterized using x-ray diffraction and high-resolution transmission electron microscopy, and the normal-incidence reflectivity has been measured using synchrotron radiation. It is found that, under optimum deposition conditions, the ML structures exhibit smooth and compositionally abrupt interfaces, with a normal-incidence reflectivity as high as 20% at 7.2 nm. The reflectivity decreases when the ML structures are annealed at 500°C owing to interdiffusion and compound formation at the interfaces.Keywords
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