Plasma characterization in sputtering processes using the Langmuir probe technique
- 1 May 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 68 (2) , 381-392
- https://doi.org/10.1016/0040-6090(80)90270-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Measurement of plasma discharge characteristics for sputtering applicationsJournal of Vacuum Science and Technology, 1978
- Plasma diagnostics with electric probesJournal of Vacuum Science and Technology, 1978
- Diagnostic methods for sputtering plasmasJournal of Vacuum Science and Technology, 1978
- Pressure dependence of electron temperature using rf-floated electrostatic probes in rf plasmasApplied Physics Letters, 1977
- Plasma Diagnostics and Energy Transport of a dc Discharge Used for SputteringJournal of Applied Physics, 1972
- Investigation of an rf Plasma with Symmetrical and Asymmetrical Electrostatic ProbesJournal of Applied Physics, 1972
- Investigation of Sputtered β-Tantalum Thin FilmsJournal of Vacuum Science and Technology, 1967
- Saturation Ion Currents to Langmuir ProbesJournal of Applied Physics, 1965