The formation of complexes of the type X2+⋅R in rf rare gas glow discharges
- 15 January 1976
- journal article
- letter
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 64 (2) , 907-908
- https://doi.org/10.1063/1.432204
Abstract
Complexes of the type X++⋅R (where X is an atom with reasonably low first and second ionization potentials and where R is a rare gas) have been observed in rf rare gas glow discharges. These complexes are believed to be formed by associative ionization of the singly charged ion X+ : X+ +Rm+→X++⋅R+e.Keywords
This publication has 3 references indexed in Scilit:
- Diagnostics of an r.f. sputtering glow discharge - correlation between atomic absorption and mass spectrometryInternational Journal of Mass Spectrometry and Ion Physics, 1975
- Glow-discharge mass spectrometry—Technique for determining elemental composition profiles in solidsJournal of Applied Physics, 1974
- PLASMA DIAGNOSTICS OF AN rf-SPUTTERING GLOW DISCHARGEApplied Physics Letters, 1971