Scattering of non-relativistic electrons in tip structures

Publisher Website
Google Scholar
Abstract
Fine tip structures are required for many applications in different technologies, for example in scanning probe microscopy or vacuum microelectronic devices. Tips can be produced with nanometre precision by the electron-beam-induced deposition technique. The deposition process, however, is still not really understood. This paper describes the results of a Monte Carlo simulation of electron scattering in tip structures, which reveal some fundamental differences from flat and tilted bulk substrates. An analytical expression is found for the total energy loss of electrons in tips consisting of various materials deposited at 8-30 keV beam energy.