Use of the biased estimator in the interpretation of spectroscopic ellipsometry data
- 10 August 1991
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 30 (23) , 3354-3360
- https://doi.org/10.1364/ao.30.003354
Abstract
The use of the biased estimator in the fitting of spectroscopic ellipsometry data is examined and applied to data from two-channel polarization modulation ellipsometry experiments. It is pointed out that the use of the biased estimator, as opposed to the unbiased estimator that is usually found in the literature, allows the experimentalist to weight properly the more accurate parts of the spectrum, to switch among different representations of the data, and to calculate a goodness of fit. The fit to data taken on a 59-nm SiO2 film on Si is examined with both the biased and the unbiased estimators.Keywords
This publication has 16 references indexed in Scilit:
- Influence of substrate structure on the growth of hydrogenated amorphous silicon studied by i n s i t u ellipsometryJournal of Applied Physics, 1986
- Proper choice of the error function in modeling spectroellipsometric dataApplied Optics, 1986
- Errors in ellipsometry measurements made with a photoelastic modulatorJournal of the Optical Society of America, 1983
- Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eVPhysical Review B, 1983
- Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometryPhysical Review B, 1979
- Optical Properties of the Interface between Si and Its Thermally Grown OxidePhysical Review Letters, 1979
- Interspecimen Comparison of the Refractive Index of Fused Silica*,†Journal of the Optical Society of America, 1965
- Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen SubstanzenAnnalen der Physik, 1935