Systematic trends in van der Waals interactions: Atom–atom and atom–surface cases
- 1 October 1987
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 87 (7) , 3995-3999
- https://doi.org/10.1063/1.452902
Abstract
Correlations are discussed for van der Waals interactions [V(x)] of two types: between two atoms and between an atom and a surface. Letting ε be the well depth and Cn be the asymptotic dispersion coefficient [such that V(x) ∼ - Cnx-n], it is shown that (C n/ε)1/n is proportional to the equilibrium distance and to the decay length of the repulsive part of the interaction. A simple model which describes and unifies these correlations is presenteKeywords
This publication has 15 references indexed in Scilit:
- Modelling of repulsive potentials from atom charge density distributions: interactions of inert gas atomsChemical Physics Letters, 1986
- Regularities in van der Waals forces: correlation between the potential parameters and polarizabilityChemical Physics Letters, 1985
- Bounds to two- and three-body long-range interaction coefficients for S-state atomsThe Journal of Chemical Physics, 1985
- Interaction Potential between a Helium Atom and Metal SurfacesPhysical Review Letters, 1985
- Gas—surface interactions and dynamics; Thermal energy atomic and molecular beam studiesSurface Science Reports, 1984
- The interaction of helium with smooth metal surfacesJournal of Physics C: Solid State Physics, 1984
- Shape of physical adsorption potentialsPhysical Review B, 1983
- Interaction of helium with a metal surfaceJournal of Physics C: Solid State Physics, 1982
- Dependence of the He-Scattering Potential at Surfaces on the Surface-Electron-Density ProfilePhysical Review Letters, 1980
- Theory of Metal Surfaces: Charge Density and Surface EnergyPhysical Review B, 1970