Design of fast deflection coils for an electron-beam microfabrication system
- 1 November 1975
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 12 (6) , 1152-1155
- https://doi.org/10.1116/1.568479
Abstract
The design of improved postlens deflection coils for electron-beam microfabrication is described. These coils were made for use in a Cambridge Instrument Co. model S-4 scanning-electron-microscope column. These new coils permit a 0.8-nA 20-kV beam to cover a 2-mm-square scan field with a theoretical resolution of 0.1 μm.Keywords
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