Chemical and Electrical Characterization of the Interaction of BCl3 / Cl2 Etching and CF 4 / H 2 O Stripping Plasmas with Aluminum Surfaces
- 1 November 1999
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 146 (11) , 4230-4235
- https://doi.org/10.1149/1.1392619
Abstract
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