Plasma Etching of Silicon Dioxide and Silicon Nitride with Non-Perfluorocompound Chemistries: Trifluoroacetic Anhydride and Iodofluorocarbons
- 1 January 1996
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
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- Ozone depletion and global warming potentials of CF3IJournal of Geophysical Research: Atmospheres, 1994