Plasma enhanced chemical vapor deposition of Si-N-C-H films from environmentally benign organosilanes
- 30 June 1995
- journal article
- Published by Elsevier in Materials Letters
- Vol. 24 (1-3) , 47-52
- https://doi.org/10.1016/0167-577x(95)00069-0
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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