Sub-picosecond UV-laser ablation of Ni films
- 1 July 1994
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 59 (1) , 79-82
- https://doi.org/10.1007/bf00348424
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- The influence of thermal diffusion on laser ablation of metal filmsApplied Physics A, 1994
- Time resolved dynamics of subpicosecond laser ablationApplied Physics Letters, 1993
- Ultraviolet laser ablation of halides and oxidesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992
- Picosecond UV Excimer Laser Ablation of LiNbO3MRS Proceedings, 1990
- UV-excimer-laser ablation of polymethylmethacrylate at 248 nm: Characterization of incubation sites with Fourier transform IR- and UV-SpectroscopyApplied Physics A, 1989
- Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulsesApplied Physics Letters, 1989
- Influence of the beam spot size on ablation rates in pulsed-laser processingApplied Physics Letters, 1987
- Laser-Beam Interactions with MaterialsPublished by Springer Nature ,1987
- Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiationApplied Physics Letters, 1982
- Deep uv submicron lithography by using a pulsed high-power excimer laserJournal of Applied Physics, 1982