Laser microchemical techniques for reversible restructuring of gate-array prototype circuits

1 February 1984

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 5 (2) , 32-35
https://doi.org/10.1109/edl.1984.25822

Abstract

Laser direct-write Al etching and poly-Si deposition have been adapted to the mask-free alteration of simple gate-array test circuits. Simple test structures on commercial CMOS chips have been reconfigured with no degradation in device or circuit performance. These new methods may be useful for rapid evaluation and optimization of integrated-circuit prototypes.

Keywords

PROTOTYPES
CIRCUIT TESTING
ETCHING
CHEMICAL LASERS
LASER MODES
INTEGRATED CIRCUIT INTERCONNECTIONS
OPTICAL REFRACTION
WRITING
LASER BEAMS
OPTICAL DEVICE FABRICATION

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