Photolysis of 1,1,1‐trifluoromethylazomethane as a source of methyl and trifluoromethyl radicals

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Abstract
The photochemistry of 1,1,1‐trifluoromethylazomethane has been partially characterized. The quantum yield for N2 formation from photolysis at 366 nm and room temperature was unity at low pressure and decreased to 0.5 at 630 torr. At room temperature the principal products were C2H6, C2F6, CH3CF3 (or CH2CF2 + HF at reduced pressures), plus substituted hydrazines, which mainly arise from addition of CF3 to the parent followed by combination of these radicals with CH3 or CF3. These fluorinated methyl hydrazine products detract from the general utility of CF3‐N2‐R compounds as sources for simultaneous study of the chemistry of CF3 and R radicals. At room temperature the hydrazine products accounted for more than 50% of the total yield; however, these products can be reduced by lowering the temperature and at 195°K their yields are negligible. The quantum yield for intramolecular (direct) formation of CH3CF3 + N2 was shown to be ≤0.002.

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