CH3Cl adsorption on a Si(100)2 × 1 surface modified by alkali metal overlayer studied by soft X-ray photoemission using synchrotron radiation
- 1 August 1988
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 202 (3) , L568-L576
- https://doi.org/10.1016/0039-6028(88)90033-7
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- Benzene adsorption on low-temperature silicon: A synchrotron-radiation photoemission study of valence and core statesPhysical Review B, 1987
- Catalytic Oxidation of Semiconductors by Alkali MetalsPhysica Scripta, 1987
- Bonding of noble metals to semiconductor surfaces: first-principles calculations of copper and silver on silicon(111)Journal of the American Chemical Society, 1987
- X-Ray photoelectron spectroscopy investigation of direct process contact massesJournal of Catalysis, 1987
- SiO2-Si interface formation by catalytic oxidation using alkali metals and removal of the catalyst speciesJournal of Applied Physics, 1986
- Sodium-induced modifications in the electronic structure of the W(100) surfaceJournal of Physics C: Solid State Physics, 1986
- Electronic properties and bonding sites for chlorine chemisorption on Si(111)-(7×7)Physical Review B, 1985
- Surface energy bands and atomic position of Cl chemisorbed on cleaved Si(111)Physical Review B, 1978
- Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiationPhysical Review B, 1977
- The Direct Synthesis of Organosilicon CompoundsJournal of the American Chemical Society, 1945