Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds
- 1 July 1991
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 139, 61-66
- https://doi.org/10.1016/0921-5093(91)90597-g
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursorsChemistry of Materials, 1990
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984