A Study of Postannealing and in situ Annealing of Silicon Wafers Implanted with a High Dose of Oxygen
- 1 January 1988
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 135 (1) , 186-190
- https://doi.org/10.1149/1.2095550
Abstract
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