Improvement of Gate Oxide Integrity Characteristics in CZ-Grown Si Crystals by H2 annealing
- 1 January 1992
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
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This publication has 1 reference indexed in Scilit:
- Crystal-Originated Singularities on Si Wafer Surface after SC1 CleaningJapanese Journal of Applied Physics, 1990