Vertical inhomogeneity of the magnetization reversal in antiferromagnetically coupled Co/Cu multilayers at the first maximum

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Abstract
Magnetization behavior in antiferromagnetically (AFM) coupled multilayer systems was calculated by using an atomic layer model. Comparisons with the experimental results obtained on sputtered Co/Cu multilayers reveal remarkable differences in the magnetization reversal and in the field dependence of the magnetoresistance. Kerr loops measured from both sides of the stack display strong vertical differences. At the lower side near the Fe seed layer the magnetization reversal is in good agreement with that of our calculations whereas near the surface in large portions of the stack the AFM coupling is destroyed or varied. These effects are presumably caused by magnetic short circuits at defects in the multilayer structure. Cross‐section transmission electron microscopy reveals growth defects which seem to be responsible for the deviations from the calculated ideal behavior.