Analysis of ultrashallow doping profiles obtained by low energy ion implantation

• 1 January 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 14  (1) , 260-264
• https://doi.org/10.1116/1.588458

Abstract

Keywords

• ION IMPLANTATION