Identifying defects in deep-submicron CMOS ICs
- 1 September 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Spectrum
- Vol. 33 (9) , 66-71
- https://doi.org/10.1109/6.535396
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Scaling of MOS technology to submicrometer feature sizesAnalog Integrated Circuits and Signal Processing, 1994