Very Low Temperature Chemical Vapor Deposition of Silicon Dioxide Films using Ozone and Organosilane
Open Access
- 5 October 1977
- journal article
- Published by The Electrochemical Society of Japan in Denki Kagaku oyobi Kogyo Butsuri Kagaku
- Vol. 45 (10) , 654-659
- https://doi.org/10.5796/kogyobutsurikagaku.45.654
Abstract
Japan's largest platform for academic e-journals: J-STAGE is a full text database for reviewed academic papers published by Japanese societiesThis publication has 0 references indexed in Scilit: