Effects of U.V. light on the transport properties of a-Si : H films during their growth
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 1399-1402
- https://doi.org/10.1016/0022-3093(87)90335-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Excimer-Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous SiliconJapanese Journal of Applied Physics, 1985
- Growth rate of amorphous hydrogenated silicon alloys produced under crossed static electric and magnetic fieldsThin Solid Films, 1982